The new generation of target materials was successfully developed, leading the wave of high-tech industry innovation

Specific application areas of new target materials include:

Semiconductor field: New target materials are widely used in the semiconductor field, such as electrodes, wiring films, memory electrode films, adhesion films, capacitor insulating films, etc. These target materials include aluminum, copper, gold, silver, palladium, platinum, aluminum-silicon alloy, aluminum-silicon-copper alloy, etc.

Magnetic recording field: The application of new target materials in the magnetic recording field is also very important, such as perpendicular magnetic recording films, hard disk films, thin film magnetic heads, artificial crystal films, etc. These target materials include cobalt-chromium alloy, cobalt-chromium-tantalum alloy, cobalt-chromium-platinum alloy, cobalt-chromium-tantalum-platinum alloy, cobalt-tantalum-chromium alloy, cobalt-chromium-zirconium alloy, cobalt-platinum alloy, cobalt-palladium alloy, etc.

Optical recording field: The application of new target materials in the optical recording field is also very critical, such as phase change optical disc recording film, magneto-optical disc recording film, optical disc reflective film, optical disc protective film, etc. These target materials include tellurium selenide, antimony selenide, germanium antimony tellurium alloy, germanium tellurium alloy, dysprosium iron cobalt alloy, terbium iron dysprosium alloy, terbium iron cobalt alloy, aluminum oxide, magnesium oxide, silicon nitride, etc.

Display field: The application of new target materials in the display field is also very important, such as transparent conductive films, electrode wiring films, electroluminescent films, etc. These target materials include indium tin oxide, zinc aluminum oxide, molybdenum, tungsten, titanium, tantalum, chromium, aluminum, aluminum-titanium alloy, aluminum-tantalum alloy, etc.

Other application fields: New target materials are also widely used in other application fields, such as decorative films, low resistance films, superconducting films, tool plating films, etc. These target materials include titanium, zirconium, chromium, titanium aluminum alloy, stainless steel, nickel chromium alloy, nickel chromium silicon alloy, nickel chromium aluminum alloy, nickel copper alloy, yttrium barium copper oxide, bismuth strontium calcium copper oxide, etc.

In short, new target materials are widely used in high-tech and industrial fields such as electronics, magnetism, optics, optoelectronics and superconducting thin films. They are one of the main technologies for preparing thin film materials and are of great significance in promoting the development of related industries.