What are the characteristics of the preparation process of target materials?

The preparation process of new target materials has the following characteristics:

High Purity: New target materials require high purity to ensure the performance and consistency of the final product. During the preparation process, the sources and processing procedures of raw materials need to be strictly controlled to reduce the introduction of impurities.

Precise control of chemical composition: The chemical composition of new target materials needs to be strictly controlled to ensure the performance and consistency of the final product. In the preparation of alloys or composite materials, precise control of composition is particularly important. This usually involves precise proportioning and a uniform mixing process.

High density and low porosity: New target materials require high density and low porosity to improve their physical properties, such as strength and thermal conductivity. Controlling appropriate temperature and pressure during the sintering or pressing process can significantly improve the density and uniformity of the target material.

Advanced preparation technology: Advanced preparation technologies are used in the preparation process of new target materials, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), etc. These technologies can achieve high purity and high uniformity films.

Heat treatment and post-treatment: Heat treatment and post-treatment are required during the preparation process of new target materials to improve target performance. By controlling the temperature and time of heat treatment, the microstructure and stress state of the target can be optimized, thereby improving its performance. In addition, post-processing steps, such as machining and surface treatment, are also important links to ensure target quality and performance.

Material properties and performance testing: Material properties and performance testing are required during the preparation process of new target materials to evaluate the uniformity and defects of the target, such as pores and inclusions. Density is usually measured using the water level method or Archimedes' principle.

In short, the preparation process of new target materials has the characteristics of high purity, precise control of chemical composition, high density and low porosity, advanced preparation technology, heat treatment and post-processing, and material properties and performance testing. These characteristics ensure the wide application of new target materials in semiconductor, optoelectronics and other fields.